Hole mask colloidal lithography on magnetic multilayers for spin torque applications
Paper i proceeding, 2010

We demonstrate the fabrication of metallic nano-contacts on magnetic multilayers using a Hole Mask Colloidal Lithography technique (HCL) based on Polystyrene spheres. The method applies PMMA as a sacrificial layer upon which a hole pattern is formed after lift- off of the spheres. An Au layer functions as a hard mask for the PMMA and the PMMA subsequently masks the SiO2 during its etching. The resulting pattern is a dense collection of randomly located nano-holes through a SiO2 film. Final devices are made using traditional photolithography to define a 600 nm circular mesa with about 3 to 4 nano-holes per device, and patterning of a metallic top contact.


Sohrab R. Sani

Kungliga Tekniska Högskolan (KTH)

Johan Persson

Kungliga Tekniska Högskolan (KTH)

Alexander Dmitriev

Chalmers, Teknisk fysik, Bionanofotonik

Mikael Käll

Chalmers, Teknisk fysik, Bionanofotonik

Johan Åkerman

Göteborgs universitet

Journal of Physics: Conference Series

17426588 (ISSN) 17426596 (eISSN)

Vol. 200 SECTION 7 072078- 072078


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