Charging Phenomena at the Interface Between High-k Dielectrics and SiOx Interlayers (Invited)
Journal article, 2010

Author

Olof Engström

Chalmers, Microtechnology and Nanoscience (MC2)

Bahman Raeissi

Chalmers, Microtechnology and Nanoscience (MC2)

Johan Piscator

Chalmers, Microtechnology and Nanoscience (MC2)

I. Z. Mitrovic

University of Liverpool

S. Hall

University of Liverpool

H. D. B. Gottlob

Advanced Microelectronic Center Aachen (AMICA)

M Schmidt

Advanced Microelectronic Center Aachen (AMICA)

P.K- Hurley

University College Cork

K. Cherkaoui

Université de Lyon

Journal of Telecommunications and Information Technology

1509-4553 (ISSN) 1899-8852 (eISSN)

Vol. 1 10-

Areas of Advance

Information and Communication Technology

Nanoscience and Nanotechnology (SO 2010-2017, EI 2018-)

Subject Categories

Other Engineering and Technologies not elsewhere specified

Electrical Engineering, Electronic Engineering, Information Engineering

More information

Latest update

8/6/2020 1