Multilevel phase holograms manufactured by electron-beam lithography
Journal article, 1990

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to the authors' knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to the authors' knowledge, the highest reported to date


electron beam lithography


Mats Ekberg

Department of Applied Electron Physics

J. Michael Larsson

Department of Applied Electron Physics

Sverker Hård

Department of Microelectronics and Nanoscience

Bengt Nilsson

Department of Physics

Optics Letters

0146-9592 (ISSN) 1539-4794 (eISSN)

Vol. 15 568-569

Areas of Advance

Information and Communication Technology

Nanoscience and Nanotechnology

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering



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