Multilevel phase holograms manufactured by electron-beam lithography
Journal article, 1990

Ten-level transmission phase holograms (kinoforms) manufactured in one resist layer by electron-beam lithography are reported for the first time to the authors' knowledge. The measured hologram diffraction efficiencies were 70% for the two resist materials used. This corresponds to 82% of the maximum theoretical value for these holograms and is, to the authors' knowledge, the highest reported to date

holography

electron beam lithography

Author

Mats Ekberg

Department of Applied Electron Physics

J. Michael Larsson

Department of Applied Electron Physics

Sverker Hård

Department of Microelectronics and Nanoscience

Bengt Nilsson

Department of Physics

Optics Letters

0146-9592 (ISSN) 1539-4794 (eISSN)

Vol. 15 568-569

Areas of Advance

Information and Communication Technology

Nanoscience and Nanotechnology (2010-2017)

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1364/OL.15.000568

More information

Created

10/7/2017