HfO2 gate dielectrics on strained-Si and strained-SiGe layers
Journal article, 2003
Author
Mikael Johansson
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
Mahdi Yousif
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
Per Lundgren
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
Stefan Bengtsson
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
J. Sundqvist
Anders Harsta
H. H. Radamson
Semiconductor Science And Technology
Vol. 18 9 820-826
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering