Modification of silicon surfaces with H2SO4:H2O2:HF and HNO3:HF for wafer bonding applications
Journal article, 1996

Author

Karin Ljungberg

Ulf Jansson

Stefan Bengtsson

Department of Solid State Electronics

Other publications Research

Anders Soderbarg

Journal Of The Electrochemical Society

Vol. 143 5 1709-1714

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

More information

Created

10/7/2017

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