Effect of Si cap layer on parasitic channel operation in Si/SiGe metal-oxide-semiconductor structures
Journal article, 2003
Author
Alok Sareen
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
Y. Wang
Ulf Södervall
Engineering and Industrial Design, MC2 Process Laboratory
Per Lundgren
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
Stefan Bengtsson
Chalmers, Microtechnology and Nanoscience (MC2), Solid State Electronics
Journal Of Applied Physics
Vol. 93 6 3545-3552
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering