Growth mechanism of graphene on platinum: Surface catalysis and carbon segregation
Journal article, 2014

A model of the graphene growth mechanism of chemical vapor deposition on platinum is proposed and verified by experiments. Surface catalysis and carbon segregation occur, respectively, at high and low temperatures in the process, representing the so-called balance and segregation regimes. Catalysis leads to self-limiting formation of large area monolayer graphene, whereas segregation results in multilayers, which evidently "grow from below." By controlling kinetic factors, dominantly monolayer graphene whose high quality has been confirmed by quantum Hall measurement can be deposited on platinum with hydrogen-rich environment, quench cooling, tiny but continuous methane flow and about 1000 degrees C growth temperature. (C) 2014 AIP Publishing LLC.

1969

P389

V3

CHEMICAL-VAPOR-DEPOSITION

LELLAN RB

SCRIPTA METALLURGICA

SOLUBILITY

Author

Jie Sun

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Youngwoo Nam

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Niclas Lindvall

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

M. T. Cole

University of Cambridge

K. B. K. Teo

Aixtron

YungWoo Park

Seoul National University

Avgust Yurgens

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Applied Physics Letters

0003-6951 (ISSN) 1077-3118 (eISSN)

Vol. 104 15 152107

Subject Categories

Physical Sciences

DOI

10.1063/1.4871978

More information

Latest update

10/15/2020