Nanopatterning of Mobile Lipid Mono layers on Electron-Beam-Sculpted Teflon AF Surfaces
Journal article, 2015

Direct electron-beam lithography is used to fabricate nanostructured Teflon AF surfaces, which are utilized to pattern,surface-supported monolayer phospholipid films with 50 nm lateral feature size. In comparison with unexposed Teflon AF coatings, e-beam-irradiated areas show reduced surface tension and surface potential. For phospholipid monolayer spreading experiments, these areas can be designed to function as barriers that enclose unexposed areas of nanometer dimensions and confine the lipid film within. We show that the effectiveness of the barrier is defined by pattern geometry and radiation dose. This surface preparation technique represents an efficient, yet simple, nanopatterning strategy supporting studies of lipid monolayer behavior in ultraconfined spaces. The generated structures are useful for imaging studies of biomimetic membranes and other specialized surface applications requiring spatially controlled formation of self-assembled, molecularly thin films on optically transparent patterned polymer surfaces with very low autofluorescence.

nanofluidics

lipid monolayer

e-beam sculpting

Teflon AF

lipid spreading

Author

Mehrnaz Shaali

Chalmers, Chemistry and Chemical Engineering, Chemistry and Biochemistry

Samuel Lara Avila

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Paul Gunnar Dommersnes

Norwegian University of Science and Technology (NTNU)

Alar Ainla

Harvard University

Sergey Kubatkin

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Aldo Jesorka

Chalmers, Chemistry and Chemical Engineering, Chemistry and Biochemistry

ACS Nano

1936-0851 (ISSN) 1936-086X (eISSN)

Vol. 9 2 1271-1279

Areas of Advance

Nanoscience and Nanotechnology

Roots

Basic sciences

Infrastructure

Nanofabrication Laboratory

Subject Categories

Chemical Sciences

DOI

10.1021/nn5050867

More information

Latest update

4/20/2018