Nanopatterning of Mobile Lipid Mono layers on Electron-Beam-Sculpted Teflon AF Surfaces
Artikel i vetenskaplig tidskrift, 2015

Direct electron-beam lithography is used to fabricate nanostructured Teflon AF surfaces, which are utilized to pattern,surface-supported monolayer phospholipid films with 50 nm lateral feature size. In comparison with unexposed Teflon AF coatings, e-beam-irradiated areas show reduced surface tension and surface potential. For phospholipid monolayer spreading experiments, these areas can be designed to function as barriers that enclose unexposed areas of nanometer dimensions and confine the lipid film within. We show that the effectiveness of the barrier is defined by pattern geometry and radiation dose. This surface preparation technique represents an efficient, yet simple, nanopatterning strategy supporting studies of lipid monolayer behavior in ultraconfined spaces. The generated structures are useful for imaging studies of biomimetic membranes and other specialized surface applications requiring spatially controlled formation of self-assembled, molecularly thin films on optically transparent patterned polymer surfaces with very low autofluorescence.

nanofluidics

lipid monolayer

e-beam sculpting

Teflon AF

lipid spreading

Författare

Mehrnaz Shaali

Chalmers, Kemi och kemiteknik, Kemi och biokemi, Fysikalisk kemi

Samuel Lara Avila

Chalmers, Mikroteknologi och nanovetenskap (MC2), Kvantkomponentfysik

Paul Gunnar Dommersnes

Norges teknisk-naturvitenskapelige universitet

Alar Ainla

Harvard University

Sergey Kubatkin

Chalmers, Mikroteknologi och nanovetenskap (MC2), Kvantkomponentfysik

Aldo Jesorka

Chalmers, Kemi och kemiteknik, Kemi och biokemi, Fysikalisk kemi

ACS Nano

1936-0851 (ISSN) 1936-086X (eISSN)

Vol. 9 2 1271-1279

Styrkeområden

Nanovetenskap och nanoteknik

Fundament

Grundläggande vetenskaper

Infrastruktur

Nanotekniklaboratoriet

Ämneskategorier

Kemi

DOI

10.1021/nn5050867