Controlling deposition of nanoparticles by tuning surface charge of SiO2 by surface modifications
Journal article, 2016
Author
Johnas Eklöf
Chalmers, Chemistry and Chemical Engineering, Applied Chemistry
Tina Gschneidtner
Chalmers, Chemistry and Chemical Engineering, Applied Chemistry
Samuel Lara Avila
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
Kim Nygård
University of Gothenburg
Kasper Moth-Poulsen
Chalmers, Chemistry and Chemical Engineering, Applied Chemistry
RSC Advances
20462069 (eISSN)
Vol. 6 106 104246-104253Areas of Advance
Nanoscience and Nanotechnology
Subject Categories
Physical Chemistry
Materials Chemistry
Other Physics Topics
Infrastructure
Chalmers Materials Analysis Laboratory
Nanofabrication Laboratory
DOI
10.1039/c6ra22412a