Study of MgB2 ultra-thin films in submicron size bridges
Journal article, 2017

We discuss a custom built hybrid physical chemical vapour deposition (HPCVD) system for MgB2 ultra-thin film deposition: construction, deposition process development, and optimization. Achieved films on SiC substrates have a critical temperature (Tc) ranging from 35K (10nm thick films) to 41K (40nm thick films). The 20nm thick unpatterned film had a room temperature resistivity of 13μΩ·cm, whereas it becomes 50μΩ·cm in sub-micrometer size bridges with a critical current density Jc (4.2K) up to 1.2×10^8A/cm2. The lower value of resistivity corresponds to the higher of both Tc and Jc. The surface roughness, measured with an atomic force microscope (AFM), is approximately 1.5nm.

magnesium diboride

thin film

hot-electron bolometer

HPCVD

superconductivity

Author

Evgenii Novoselov

Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory

Naichuan M. Zhang

Chalmers, Microtechnology and Nanoscience (MC2)

Serguei Cherednichenko

Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory

IEEE Transactions on Applied Superconductivity

1051-8223 (ISSN)

Vol. 27 4 7792198

Areas of Advance

Nanoscience and Nanotechnology (2010-2017)

Subject Categories

Nano Technology

Other Electrical Engineering, Electronic Engineering, Information Engineering

Condensed Matter Physics

Infrastructure

Nanofabrication Laboratory

DOI

10.1109/TASC.2016.2642052

More information

Created

10/7/2017