Study of MgB2 ultra-thin films in submicron size bridges
Artikel i vetenskaplig tidskrift, 2017

We discuss a custom built hybrid physical chemical vapour deposition (HPCVD) system for MgB2 ultra-thin film deposition: construction, deposition process development, and optimization. Achieved films on SiC substrates have a critical temperature (Tc) ranging from 35K (10nm thick films) to 41K (40nm thick films). The 20nm thick unpatterned film had a room temperature resistivity of 13μΩ·cm, whereas it becomes 50μΩ·cm in sub-micrometer size bridges with a critical current density Jc (4.2K) up to 1.2×10^8A/cm2. The lower value of resistivity corresponds to the higher of both Tc and Jc. The surface roughness, measured with an atomic force microscope (AFM), is approximately 1.5nm.

magnesium diboride

thin film

hot-electron bolometer

HPCVD

superconductivity

Författare

Evgenii Novoselov

Chalmers, Mikroteknologi och nanovetenskap (MC2), Terahertz- och millimetervågsteknik

Naichuan M. Zhang

Chalmers, Mikroteknologi och nanovetenskap (MC2)

Serguei Cherednichenko

Chalmers, Mikroteknologi och nanovetenskap (MC2), Terahertz- och millimetervågsteknik

IEEE Transactions on Applied Superconductivity

1051-8223 (ISSN)

Vol. 27 4 7792198

Styrkeområden

Nanovetenskap och nanoteknik

Ämneskategorier

Nanoteknik

Annan elektroteknik och elektronik

Den kondenserade materiens fysik

Infrastruktur

Nanotekniklaboratoriet

DOI

10.1109/TASC.2016.2642052

Mer information

Skapat

2017-10-07