Influence of the channel width on the threshold voltage modulation in MOSFETs
Journal article, 1975

The threshold voltage of an MOS field-effect transistor is modulated by the source-to-substrate reverse bias. In the letter, the theory for long- and short-channel transistors is extended to include the influence of the channel width. The result is an analytical expression for the threshold voltage as a function of geometry and bias that agrees well with experimental data.

Field-effect transistors

channel width

threshold voltage modulation

MOSFET

Author

Kjell Jeppson

Department of Microelectronics and Nanoscience

Electronics Letters

0013-5194 (ISSN) 1350-911X (eISSN)

Vol. 11 14 297-299

Areas of Advance

Nanoscience and Nanotechnology

Subject Categories

Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1049/el:19750225

More information

Latest update

9/8/2023 8