XPS Study of Niobium and Niobium-Nitride Nanofilms
Journal article, 2018

A new, XPS-based approach to quantitative and nondestructive determination of the chemical and phase layer composition of multicomponent multilayer films is proposed. It includes a new method for subtracting the background of repeatedly inelastically scattered photoelectrons, taking into account the inhomogeneity of inelastic scattering over depth; a new way of decomposing a photoelectron line into component peaks, taking into account the physical nature of various decomposition parameters; solution of the problem of subtracting the background and decomposing the photoelectron line simultaneously; and determination of the thickness of the layers of a multilayer target using a simple equation. The phase-layer composition of nanoscale Nb and NbN films is determined, and the thicknesses of these layers are calculated.

thin films

XPS background

XPS

niobium

depth profiling

niobium nitride

Author

A. Lubenschenko

National Research University Moscow Power Engineering Institute

A Batrakov

National Research University Moscow Power Engineering Institute

I. V. Shurkaeva

National Research University Moscow Power Engineering Institute

Alexey Pavolotskiy

Chalmers, Space, Earth and Environment, Onsala Space Observatory, GARD Technology

Sascha Krause

Chalmers, Space, Earth and Environment, Onsala Space Observatory, GARD Technology

Dmitriy Ivanov

National Research University Moscow Power Engineering Institute

Olga Lubenchenko

National Research University Moscow Power Engineering Institute

Journal of Surface Investigation

1027-4510 (ISSN)

Vol. 12 4 692-700

Subject Categories

Other Physics Topics

Other Materials Engineering

Condensed Matter Physics

DOI

10.1134/S1027451018040134

More information

Latest update

9/14/2018