XPS Study of Niobium and Niobium-Nitride Nanofilms
Artikel i vetenskaplig tidskrift, 2018

A new, XPS-based approach to quantitative and nondestructive determination of the chemical and phase layer composition of multicomponent multilayer films is proposed. It includes a new method for subtracting the background of repeatedly inelastically scattered photoelectrons, taking into account the inhomogeneity of inelastic scattering over depth; a new way of decomposing a photoelectron line into component peaks, taking into account the physical nature of various decomposition parameters; solution of the problem of subtracting the background and decomposing the photoelectron line simultaneously; and determination of the thickness of the layers of a multilayer target using a simple equation. The phase-layer composition of nanoscale Nb and NbN films is determined, and the thicknesses of these layers are calculated.

thin films

XPS background

XPS

niobium

depth profiling

niobium nitride

Författare

A. Lubenschenko

National Research University Moscow Power Engineering Institute

A Batrakov

National Research University Moscow Power Engineering Institute

I. V. Shurkaeva

National Research University Moscow Power Engineering Institute

Alexey Pavolotskiy

Chalmers, Rymd-, geo- och miljövetenskap, Onsala rymdobservatorium, GARD teknik

Sascha Krause

Chalmers, Rymd-, geo- och miljövetenskap, Onsala rymdobservatorium, GARD teknik

Dmitriy Ivanov

National Research University Moscow Power Engineering Institute

Olga Lubenchenko

National Research University Moscow Power Engineering Institute

Journal of Surface Investigation

1027-4510 (ISSN)

Vol. 12 4 692-700

Ämneskategorier

Annan fysik

Annan materialteknik

Den kondenserade materiens fysik

DOI

10.1134/S1027451018040134

Mer information

Senast uppdaterat

2018-09-14