Electroless Deposition of 4 μm High Ni/Au Bumps for 8 μm Pitch Interconnection
Journal article, 2022
interconnection
activation
ultrafine pitch
electroless plating
Ni/Au bumps
Author
Liang Tian
Fuzhou University
Chang Lin
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Fuzhou University
Kui Pan
Fuzhou University
Yu Lu
Fuzhou University
Liying Deng
Fuzhou University
Zhonghang Huang
Fuzhou University
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Tianxi Yang
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Fuzhou University
Yongai Zhang
Fuzhou University
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Jie Sun
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
Fuzhou University
Qun Yan
Rich Sense Electronics Technology Co.
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Fuzhou University
ACS Applied Electronic Materials
26376113 (eISSN)
Vol. 4 10 4966-4971Subject Categories
Other Physics Topics
Metallurgy and Metallic Materials
Condensed Matter Physics
Areas of Advance
Materials Science
DOI
10.1021/acsaelm.2c00974