Electroless Deposition of 4 μm High Ni/Au Bumps for 8 μm Pitch Interconnection
Artikel i vetenskaplig tidskrift, 2022
interconnection
activation
ultrafine pitch
electroless plating
Ni/Au bumps
Författare
Liang Tian
Fuzhou University
Chang Lin
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Fuzhou University
Kui Pan
Fuzhou University
Yu Lu
Fuzhou University
Liying Deng
Fuzhou University
Zhonghang Huang
Fuzhou University
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Tianxi Yang
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Fuzhou University
Yongai Zhang
Fuzhou University
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Jie Sun
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Chalmers, Mikroteknologi och nanovetenskap, Kvantkomponentfysik
Fuzhou University
Qun Yan
Rich Sense Electronics Technology Co.
Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China
Fuzhou University
ACS Applied Electronic Materials
26376113 (eISSN)
Vol. 4 10 4966-4971Ämneskategorier
Annan fysik
Metallurgi och metalliska material
Den kondenserade materiens fysik
Styrkeområden
Materialvetenskap
DOI
10.1021/acsaelm.2c00974