Decomposition pathways in nano-lamellar CVD Ti0.2 Al0.8 N
Journal article, 2023
Phase stability
Phase separation
(Ti,Al)N
Chemical vapour deposition (CVD)
Coatings
Author
Olof Bäcke
Chalmers, Physics, Microstructure Physics
Sebastian Kalbfleisch
MAX IV Laboratory
Dirk Stiens
Walter AG
Thorsten Manns
Walter AG
Anton Davydok
Helmholtz
Mats Halvarsson
Chalmers, Physics, Microstructure Physics
Magnus Hörnqvist Colliander
Chalmers, Physics, Microstructure Physics
Materialia
25891529 (eISSN)
Vol. 30 101833CVD 2.0 - En ny generation av hårda beläggningar
Swedish Foundation for Strategic Research (SSF) (RMA15-0048), 2016-05-01 -- 2021-06-30.
Subject Categories
Manufacturing, Surface and Joining Technology
Condensed Matter Physics
DOI
10.1016/j.mtla.2023.101833