Decomposition pathways in nano-lamellar CVD Ti0.2 Al0.8 N
Journal article, 2023
Coatings
Phase stability
Phase separation
(Ti,Al)N
Chemical vapour deposition (CVD)
Author
Olof Bäcke
Chalmers, Physics, Microstructure Physics
Sebastian Kalbfleisch
MAX IV Laboratory
Dirk Stiens
Walter
Thorsten Manns
Walter
Anton Davydok
Helmholtz
Mats Halvarsson
Chalmers, Physics, Microstructure Physics
Magnus Hörnqvist Colliander
Chalmers, Physics, Microstructure Physics
Materialia
25891529 (eISSN)
Vol. 30 101833CVD 2.0 - En ny generation av hårda beläggningar
Swedish Foundation for Strategic Research (SSF) (RMA15-0048), 2016-05-01 -- 2021-06-30.
Subject Categories (SSIF 2011)
Manufacturing, Surface and Joining Technology
Condensed Matter Physics
DOI
10.1016/j.mtla.2023.101833