Growth of a hard, novel CVD multilayer coating: Ti(C,N) on (Ti,Al)N on TiN
Review article, 2025
A novel chemical vapor deposition (CVD) multilayer coating intended for cutting applications was designed to achieve high wear and heat resistance during metal machining. The coating consists of three layers: a TiCN layer deposited on top of a TiAlN layer, which was grown on a layer of TiN that was deposited onto a cemented carbide substrate. The detailed microstructure of the coating was examined using a combination of electron microscope techniques. Two pyramidal surface morphologies and textures were observed, which could be related to the substrate roughness. Two growth modes were found: epitaxial growth of 〈211〉 oriented TiCN on <211> oriented TiAlN on <211> oriented TiN, leading to tilted TiCN pyramids at the coating surface; and epitaxial growth of 〈111〉 TiCN on <111> TiAlN on <111> TiN, leading to symmetrical TiCN pyramids at the coating surface.
HRSTEM
Interfacial dislocations
WC-Co
TiAlN
TiCN
CVD
Author
Mohamed Ben Hassine
King Abdullah University of Science and Technology (KAUST)
Chalmers, Physics, Microstructure Physics
Hans-Olof Andrén
Chalmers, Physics, Microstructure Physics
Anand Harihara Subramonia Iyer
Chalmers, Physics, Microstructure Physics
Olof Bäcke
Chalmers, Physics, Microstructure Physics
Dirk Stiens
Walter
Wiebke Janssen
Walter
Johannes Kümmel
Walter
Mats Halvarsson
Chalmers, Physics, Microstructure Physics
International Journal of Refractory Metals and Hard Materials
02634368 (ISSN) 22133917 (eISSN)
Vol. 127 106966Subject Categories
Other Materials Engineering
DOI
10.1016/j.ijrmhm.2024.106966