Novel monocrystalline silicon micromirrors for maskless lithography
Journal article, 2008

A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.

Micromirrors

EUV lithography

Maskless Lithography

DRIE

Electrostatic actuation

Transfer bonding

Author

Martin Bring

Chalmers, Applied Physics, Electronics Material and Systems Laboratory

Peter Enoksson

Chalmers, Applied Physics, Electronics Material and Systems Laboratory

Sensors and Actuators, A: Physical

0924-4247 (ISSN)

Vol. 145-146 1-1 456-463

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1016/j.sna.2007.10.050

More information

Created

10/8/2017