Novel monocrystalline silicon micromirrors for maskless lithography
Artikel i vetenskaplig tidskrift, 2008

A novel monocrystalline silicon micromirror structure for improving image fidelity in laser pattern generators is presented. Analytical and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.

Micromirrors

EUV lithography

Maskless Lithography

DRIE

Electrostatic actuation

Transfer bonding

Författare

Martin Bring

Chalmers, Teknisk fysik, Elektronikmaterial och system

Peter Enoksson

Chalmers, Teknisk fysik, Elektronikmaterial och system

Sensors and Actuators, A: Physical

0924-4247 (ISSN)

Vol. 145-146 1-1 456-463

Ämneskategorier

Annan elektroteknik och elektronik

DOI

10.1016/j.sna.2007.10.050