Electrical Characterization of Thermally Oxidized Silicon Carbide
Doctoral thesis, 2008
Author
Fredrik Allerstam
Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics
Stable operation of high mobility 4H-SiC MOSFETs at elevated temperatures
Electronics Letters,;Vol. 41(2005)p. 825-826
Journal article
Formation of deep traps at the 4H-SiC/SiO2 interface when utilizing sodium enhanced oxidation
Materials Science Forum,;Vol. 556-557(2007)p. 517-520
Paper in proceeding
Comparison between oxidation processes used to obtain the high inversion channel mobility in 4H-SiC MOSFETs
Semiconductor Science and Technology,;Vol. 22(2007)p. 307-311
Journal article
High field effect mobility in n-channel Si face 4H-SiC MOSFETs with gate oxide grown on aluminum ion-implanted material
IEEE Electron Device Letters,;Vol. 26(2005)p. 96-98
Journal article
A strong reduction in the density of near-interface traps at the SiO2/4H-SiC interface by sodium enhanced oxidation
Journal of Applied Physics,;Vol. 101(2007)p. 124502-
Journal article
Subject Categories
Other Engineering and Technologies not elsewhere specified
Other Electrical Engineering, Electronic Engineering, Information Engineering
Condensed Matter Physics
ISBN
978-91-7385-088-9
Doktorsavhandlingar vid Chalmers tekniska högskola. Ny serie: 2769
Technical report MC2 - Department of Microtechnology and Nanoscience, Chalmers University of Technology: 121
Kollektorn (A423), MC2
Opponent: Prof. Bengt Svensson, Department of Physics, Oslo University, Norway