Substrate-dependent resistance decrease of graphene by ultraviolet-ozone charge doping
Artikel i vetenskaplig tidskrift, 2016

Large sheet resistance is the critical problem of graphene for application in electronic and optoelectronic devices as transparent electrodes. Ultraviolet/ozone (UVO) treatment is a convenient, highly effective, vacuum process and post-clean free method. This paper reveals that the effect of UVO treatment on the resistance of graphene is substrate dependent, which means that the band gap and photogenerated charge carriers of the substrates under UV illumination play a key role in the doping effect. The resistance of graphene can be decreased by as much as 80% on F8BT, GaN and PTFE substrates, by 70% on PMMA substrate, and by 50% on paraffin and glass substrates. Large band gap substrates (>hν) will induce a p-doping effect, while small band gap substrates (<hν) with plenty of photogenerated free charge carriers will induce n-doping effect. This approach will have great impact on the practical application of graphene in electronic and optoelectronic device fabrication.

Författare

Lihui Liu

Chalmers, Mikroteknologi och nanovetenskap (MC2), Kvantkomponentfysik

Z. Cao

Organisation okänd

W. Wang

Organisation okänd

Ergang Wang

Chalmers, Kemi och kemiteknik, Tillämpad kemi, Polymerteknologi

Yu Cao

Chalmers, Material- och tillverkningsteknik, Yt- och mikrostrukturteknik

Zhaoyao Zhan

Chalmers, Mikroteknologi och nanovetenskap (MC2), Kvantkomponentfysik

RSC Advances

2046-2069 (ISSN)

Vol. 6 67 62091-62098

Styrkeområden

Nanovetenskap och nanoteknik

Materialvetenskap

Ämneskategorier

Fysik

Nanoteknik

DOI

10.1039/c6ra11044d

Mer information

Senast uppdaterat

2018-05-23