A comparative study of selective dry and wet etching of germanium-tin (Ge1-xSnx) on germanium
Artikel i vetenskaplig tidskrift, 2018
GeSn
microstructure
etching process
Författare
Y. Han
Chinese Academy of Sciences
Y Li
Chinese Academy of Sciences
Y Song
Chinese Academy of Sciences
Chaodan Chi
Chinese Academy of Sciences
Z. Zhang
Chinese Academy of Sciences
ShanghaiTech University
J. J. Liu
Chinese Academy of Sciences
Z. S. Zhu
Chinese Academy of Sciences
ShanghaiTech University
Shu Min Wang
Chalmers, Mikroteknologi och nanovetenskap, Fotonik
Chinese Academy of Sciences
ShanghaiTech University
Publicerad i
Semiconductor Science and Technology
0268-1242 (ISSN) 1361-6641 (eISSN)
Vol. 33 Nummer/häfte 8 art. nr 085011Kategorisering
Ämneskategorier (SSIF 2011)
Kemiska processer
Annan materialteknik
Metallurgi och metalliska material
Identifikatorer
DOI
10.1088/1361-6641/aace43