Atomic-scale characterization of diffusion kinetics in Ru/Al multilayer thin films
Artikel i vetenskaplig tidskrift, 2019

The microstructure properties of reactive multilayers play a key role in their chemical reactions. Ru/Al multilayers are investigated in as-deposited and annealed conditions using atom probe tomography to probe the interdiffusion and early phase formation. Performing atom probe analysis was accompanied with difficulties stemming from weak adhesion of the bi-layers and reconstruction artifacts. Nonetheless, it was possible to obtain valuable qualitative information concerning diffusion kinetics. Asymmetric interdiffusion during deposition is found. Grain boundary diffusion is shown to have a major contribution on enhancing mass-transport across the layers as well as on the nucleation and growth of the RuAl6 intermetallic phase.

Thin film

Atom probe

Grain boundary


Hisham Aboulfadl

Chalmers, Fysik, Mikrostrukturfysik

Universität des Saarlandes

Frank Mücklich

Universität des Saarlandes

Materials Letters

0167-577X (ISSN) 18734979 (eISSN)

Vol. 254 344-347


Oorganisk kemi


Metallurgi och metalliska material



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