Native oxide on ultra-thin NbN films
Paper i proceeding, 2019

We report study of native oxide formation over NbN ultra-thin films. With a help of XPS, chemical and phase depth profiles of NbN film of 5 nm and 10 nm thickness exposed to room air for more than a month were recorded. The surface of those films were sputtered with Ar+ ions and consequently oxidized in room air for another few days. It was found that an intermediate layer of NbNx was formed between the niobium oxide layer and original NbN material.

Författare

A. Lubenschenko

National Research University Moscow Power Engineering Institute

Alexey Pavolotskiy

Chalmers, Rymd-, geo- och miljövetenskap, Onsala rymdobservatorium, GARD teknik

Sascha Krause

Chalmers, Rymd-, geo- och miljövetenskap, Onsala rymdobservatorium, GARD teknik

Olga Lubenchenko

National Research University Moscow Power Engineering Institute

D. A. Ivanov

National Research University Moscow Power Engineering Institute

Vincent Desmaris

Chalmers, Rymd-, geo- och miljövetenskap, Onsala rymdobservatorium, GARD teknik

Victor Belitsky

Chalmers, Rymd-, geo- och miljövetenskap, Onsala rymdobservatorium, GARD teknik

ISSTT 2019 - 30th International Symposium on Space Terahertz Technology, Proceedings Book

95-98

2019 30th International Symposium on Space Terahertz Technology, ISSTT 2019
Gothenburg, Sweden,

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2020-12-08