Titanium release from implants prepared with different surface roughness
Artikel i vetenskaplig tidskrift, 2004
OBJECTIVES: There may be a risk of greater ion release for surface-enlarged implants than conventionally turned components. The major aim of the present paper was to investigate whether a correlation exists between ion release and a surface roughness relevant for today's commercial implants. Other aims were to compare ion release after two insertion times and concentration in bone tissue as a function of distance from the implant surface. MATERIAL AND METHODS: Lactic acid aqueous solution (pH=2.3) and phosphate-buffered saline were used for the in vitro investigation. For the in vivo investigation, synchrotron radiation X-ray fluorescence (SRXRF) spectroscopy and secondary ion mass spectroscopy (SIMS) were performed 12 weeks and 1 year after implantation in rabbit tibiae. RESULTS: The average height deviation (S(a)) was 0.7, 1.27, 1.43 and 2.21 microm, respectively, for the four surfaces investigated. No difference in ion release was found in vitro. In vivo, SRXRF demonstrated slightly higher values for the roughest surface up to a distance of 400 microm from the implant surface; thereafter no difference was found. SIMS demonstrated no difference in ion release for the roughest and smoothest surfaces, but slightly more titanium in bone tissue after 1 year than after 12 weeks. Titanium rapidly decreased with distance from the implant surface. CONCLUSION: At a level relevant for commercial oral implants, no correlation was found between increasing roughness and ion release, neither in vitro nor in vivo.
Air Abrasion
X-Ray Emission
Surface Properties
Spectrometry
Titanium/*chemistry
Aluminum Oxide/chemistry
Rabbits
Bone Marrow/chemistry
*Dental Implants
Sodium Chloride/chemistry
Phosphates/chemistry
Spectrometry
*Dental Prosthesis Design
Tibia/chemistry
Dental
Time Factors
Animals
Mass
Secondary Ion
Lactic Acid/chemistry
Materials Testing
Författare
Ann Wennerberg
Göteborgs universitet
Ari Ide-Ektessabi
Shino Hatkamata
Takashi Sawase
Carina B. Johansson
Göteborgs universitet
Tomas Albrektsson
Göteborgs universitet
Anna Martinelli
Chalmers, Teknisk fysik
Ulf Södervall
Chalmers, Mikroteknologi och nanovetenskap
Hans Odelius
Göteborgs universitet
Clin Oral Implants Res
Vol. 15 5 505-12
Ämneskategorier
Odontologi