Titanium release from implants prepared with different surface roughness
Artikel i vetenskaplig tidskrift, 2004

OBJECTIVES: There may be a risk of greater ion release for surface-enlarged implants than conventionally turned components. The major aim of the present paper was to investigate whether a correlation exists between ion release and a surface roughness relevant for today's commercial implants. Other aims were to compare ion release after two insertion times and concentration in bone tissue as a function of distance from the implant surface. MATERIAL AND METHODS: Lactic acid aqueous solution (pH=2.3) and phosphate-buffered saline were used for the in vitro investigation. For the in vivo investigation, synchrotron radiation X-ray fluorescence (SRXRF) spectroscopy and secondary ion mass spectroscopy (SIMS) were performed 12 weeks and 1 year after implantation in rabbit tibiae. RESULTS: The average height deviation (S(a)) was 0.7, 1.27, 1.43 and 2.21 microm, respectively, for the four surfaces investigated. No difference in ion release was found in vitro. In vivo, SRXRF demonstrated slightly higher values for the roughest surface up to a distance of 400 microm from the implant surface; thereafter no difference was found. SIMS demonstrated no difference in ion release for the roughest and smoothest surfaces, but slightly more titanium in bone tissue after 1 year than after 12 weeks. Titanium rapidly decreased with distance from the implant surface. CONCLUSION: At a level relevant for commercial oral implants, no correlation was found between increasing roughness and ion release, neither in vitro nor in vivo.

Air Abrasion

X-Ray Emission

Surface Properties



Aluminum Oxide/chemistry


Bone Marrow/chemistry

*Dental Implants

Sodium Chloride/chemistry



*Dental Prosthesis Design



Time Factors



Secondary Ion

Lactic Acid/chemistry

Materials Testing


Ann Wennerberg

Göteborgs universitet

Ari Ide-Ektessabi

Shino Hatkamata

Takashi Sawase

Carina B. Johansson

Göteborgs universitet

Tomas Albrektsson

Göteborgs universitet

Anna Martinelli

Chalmers, Teknisk fysik

Ulf Södervall

Chalmers, Mikroteknologi och nanovetenskap (MC2)

Hans Odelius

Göteborgs universitet

Clin Oral Implants Res

Vol. 15 5 505-12



Mer information