Low-Vacuum Catalyst-Free Physical Vapor Deposition and Magnetotransport Properties of Ultrathin Bi2Se3 Nanoribbons
Artikel i vetenskaplig tidskrift, 2023

In this work, a simple catalyst-free physical vapor deposition method is optimized by adjusting source material pressure and evaporation time for the reliable obtaining of freestanding nanoribbons with thicknesses below 15 nm. The optimum synthesis temperature, time and pressure were determined for an increased yield of ultrathin Bi2Se3 nanoribbons with thicknesses of 8–15 nm. Physical and electrical characterization of the synthesized Bi2Se3 nanoribbons with thicknesses below 15 nm revealed no degradation of properties of the nanoribbons, as well as the absence of the contribution of trivial bulk charge carriers to the total conductance of the nanoribbons.

bismuth selenide

ultrathin nanoribbons

magnetotransport properties

catalyst-free physical vapor deposition

bulk-free topological insulator

Författare

Raitis Sondors

Latvijas Universitate

Kiryl Niherysh

Latvijas Universitate

J. Andzane

Latvijas Universitate

Xavier Palermo

Chalmers, Mikroteknologi och nanovetenskap, Kvantkomponentfysik

Thilo Bauch

Chalmers, Mikroteknologi och nanovetenskap, Kvantkomponentfysik

Floriana Lombardi

Chalmers, Mikroteknologi och nanovetenskap, Kvantkomponentfysik

Donats Érts

Latvijas Universitate

Nanomaterials

20794991 (eISSN)

Vol. 13 17 2484

High Frequency Topological Insulator devices for Metrology (HiTIMe)

Europeiska kommissionen (EU) (EC/H2020/766714), 2018-02-01 -- 2022-01-31.

Ämneskategorier

Materialkemi

Den kondenserade materiens fysik

DOI

10.3390/nano13172484

PubMed

37686992

Mer information

Senast uppdaterat

2023-09-21