Topographical and surface chemical characterization of nanosecond pulsed-laser micromachining of titanium at 532-nm wavelength
Artikel i vetenskaplig tidskrift, 2003
Electropolished titanium was micromachined by single, 5-ns pulses from a frequency-doubled (532 nm) Nd:YAG laser. The focal spot size was varied from 10 to 100 μm and the applied fluences varied from the melting threshold (∼ 1 J/cm2) to more than 100 J/cm2. The resulting craters were imaged by optical microscopy, topographically characterized by interferometry and chemically characterized on the surface by small-spot depth-profiling Auger electron spectroscopy and small-spot X-ray photoelectron spectroscopy. The prevailing ablation regime for the studied fluences and focal spot sizes was found to be melt ejection. The surface chemical characterization showed growing oxide thickness in the heat-affected zone (around the center spot) for increasing fluence but no difference inside the crater. Titanium nitride formation was found inside the crater.
Heat affected zone
X ray photoelectron spectroscopy
Pulsed laser applications
Optical microscopy
Image analysis
Micromachining
Electrolytic polishing
Surface topography
Nanotechnology
Auger electron spectroscopy
Interferometry
Melting
Författare
Henrik Reimers
Chalmers, Teknisk fysik
Julie Gold
Chalmers, Teknisk fysik
Bengt Herbert Kasemo
Chalmers, Teknisk fysik
Dinko Chakarov
Chalmers, Teknisk fysik
Applied Physics A: Materials Science and Processing
0947-8396 (ISSN) 1432-0630 (eISSN)
Vol. 77 491-498Ämneskategorier (SSIF 2025)
Atom- och molekylfysik och optik
DOI
10.1007/s00339-002-1477-6