Electrophoretic Deposition of Protective Spinel Coatings for Solid Oxide Cell Interconnects - Towards Stack Integration
Artikel i vetenskaplig tidskrift, 2026

We evaluated electrophoretic deposition (EPD) of spinel coatings for solid oxide cell (SOC) interconnects with a focus on stack integration. Two compositions, MnCo1.9Fe0.1O4 (MCF) and CuMn1.8Ni0.2O4 (CMN), were deposited from water/ethanol suspensions and subjected to three thermal routes: direct oxidation and two-step treatments with reduction in Ar/H2 at 900 or 1000 degrees C followed by oxidation. Structural evolution, chromium evaporation, mass gain, and ex situ area-specific resistance (ASR) were assessed. Sealant compatibility with a Ca-Ba-silicate glass and applicability to representative flow-field geometries were investigated. All coatings formed continuous layers; two-step treatments enhanced densification compared to direct oxidation. Prereduction of MCF layers at 1000 degrees C yielded the lowest Cr evaporation and mass gain, whereas CMN exhibited chromium ingress, phase variations, and coarsened microstructures. ASR values for all types remained around or below 20 m Omega cm2. Glass-joining produced dense composites; limited cation diffusion was observed for MCF, while CMN showed substantial Cu penetration into the glass. EPD produced uniform, defect-free coatings on complex flow-field structures, with only slight thickness variations across the profile. These results support MCF-EPD with a 1000 degrees C reduction step and in situ oxidation during stack assembly as a process-compatible route for protective interconnect coatings in high-temperature SOCs, while CMN remains of particular interest for intermediate-temperature applications. EPD spinel coatings benchmarked for SOC interconnect stack integration.Two-step thermal route densifies layers; 1000 degrees C pre-reduction performs best.Mn-Co outperforms Cu-Mn spinel: lowest Cr evaporation, oxidation, and suitable ASR.Uniform, defect-free coatings on complex flow-field geometries demonstrated.Glass sealant compatible; Mn-Co shows limited interdiffusion and dense joints.

electrophoretic deposition

protective coating

area-specific resistance

chromium evaporation

fuel cells - solid oxide

glass sealant

interconnects

Författare

Martin Hilger

Forschungszentrum Jülich

RWTH Aachen University

Thorbjørn Krogsgaard

Chalmers, Kemi och kemiteknik, Energi och material

Sonja-Michaela Gross-Barsnick

Forschungszentrum Jülich

Doris Sebold

Forschungszentrum Jülich

Shrikanth Syamprasad

Chalmers, Kemi och kemiteknik, Energi och material

Jan Froitzheim

Chalmers, Kemi och kemiteknik, Energi och material

Christian Lenser

Forschungszentrum Jülich

Norbert H. Menzler

RWTH Aachen University

Forschungszentrum Jülich

Journal of the Electrochemical Society

0013-4651 (ISSN) 1945-7111 (eISSN)

Vol. 173 3 034509

Ämneskategorier (SSIF 2025)

Strömningsmekanik

Keramiska och pulvermetallurgiska material

DOI

10.1149/1945-7111/ae3ebb

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Senast uppdaterat

2026-04-09