Plasma-enhanced chemical vapour deposition growth of carbon nanotubes on different metal underlayers
Artikel i vetenskaplig tidskrift, 2005

One important requirement for future applications of carbon nanotube electronic devices is the ability to controllably grow carbon nanotubes on metal electrodes. Here we show that it is possible to grow small diameter (<10 nm) vertically aligned carbon nanotubes on different metal underlayers using plasma-enhanced chemical vapour deposition. A crucial component is the insertion of a thin silicon layer between the metal and the catalyst particle. The electrical integrity of the metal electrode layer after plasma treatment and the quality of the metals as interconnects are also investigated.

carbon nanotubes nanofibres

Författare

Mohammad Kabir

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fasta tillståndets elektronik

Raluca Elena Morjan

Chalmers, Institutionen för experimentell fysik, Atomfysik

Oleg Nerushev

Göteborgs universitet

Per Lundgren

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fasta tillståndets elektronik

Stefan Bengtsson

Chalmers, Mikroteknologi och nanovetenskap (MC2)

Peter Enoksson

Chalmers, Mikroteknologi och nanovetenskap (MC2)

Eleanor E B Campbell

Göteborgs universitet

Nanotechnology

0957-4484 (ISSN) 1361-6528 (eISSN)

Vol. 16 4 458-466

Ämneskategorier

Den kondenserade materiens fysik

DOI

10.1088/0957-4484/16/4/022