Boron impurity at the Si/SiO2 interface in SOI wafers and consequences for piezoresistive MEMS devices
Journal article, 2009
Boron impurity
Piezoresistive
MEMS
SOI
Author
Alexandra Nafari
Chalmers, Applied Physics, Electronics Material and Systems
David Karlén
Cristina Rusu
Imego AB - The Institute of Micro and Nanotechnology
Krister Svensson
Karlstad University
Peter Enoksson
Chalmers, Applied Physics, Electronics Material and Systems
Journal of Micromechanics and Microengineering
0960-1317 (ISSN) 13616439 (eISSN)
Vol. 19 1 6- 015034Areas of Advance
Nanoscience and Nanotechnology
Materials Science
Infrastructure
Nanofabrication Laboratory
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering
DOI
10.1088/0960-1317/19/1/015034