Investigation of metamorphic InGaAs quantum wells using N-incorporated buffer on GaAs grown by MBE
Journal article, 2011

Strong enhancement of photoluminescence intensity from InGaAs quantum wells by incorporating nitrogen in metamorphic InGaAs buffers grown on GaAs substrates was demonstrated and investigated. The enhancement of photoluminescence intensity is found to be from both the weak strain effect and the strong lattice hardening effect, indicating blocking effect of threading dislocations due to the N incorporation. Combination of this method with a strain compensated superlattice was proved to be effective in obtaining good quality metamorphic InGaAs quantum wells.

Dislocations

Molecular beam epitaxy

Semiconducting III-V materials

Author

Yuxin Song

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Shu Min Wang

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Cao Xiaohui

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Zonghe Lai

Chalmers, Microtechnology and Nanoscience (MC2), Nanofabrication Laboratory

Mahdad Sadeghi

Chalmers, Microtechnology and Nanoscience (MC2), Nanofabrication Laboratory

Journal of Crystal Growth

0022-0248 (ISSN)

Vol. 323 1 21-25

Areas of Advance

Information and Communication Technology

Materials Science

Subject Categories

Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1016/j.jcrysgro.2010.12.048

More information

Created

10/7/2017