Applications of aluminium nitride films deposited by reactive sputtering to silicon-on-insulator materials
Journal article, 1996
Author
Stefan Bengtsson
Chalmers University of Technology
Mats Bergh
Johanneberg Science Park AB
Manolis Choumas
Department of Solid State Electronics
Christian Olesen
Chalmers
Kjell Jeppson
Department of Solid State Electronics
Japanese Journal of Applied Physics
0021-4922 (ISSN) 13474065 (eISSN)
Vol. 35 8R 4175-4181Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering
DOI
10.1143/JJAP.35.4175