Wideband RF characterization setup with high dynamic range low frequency measurement capabilities
Paper in proceedings, 2016

In this paper, a wideband RF characterization setup with low-frequency (LF) measurement capabilities is presented. Simultaneous LF and RF measurements enable studies of trapping phenomena, thermal effects and other LF-related nonlinear distortion in microwave devices using realistic wideband RF stimuli. The setup is capable of measuring up to 4 GHz through the RF path, and from DC to 125 MHz through the LF path. A study is made on how device linearity is affected by the choice of power supply unit (PSU). LF measurements reveal significant differences in baseband termination in the PSUs, consequently affecting the linearity of the measured RF output spectrum.

Radio frequency

Frequency measurement

Voltage measurement

Current measurement

Baseband

Wideband

Author

Sebastian Gustafsson

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Christian Fager

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Koen Buisman

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

Mattias Thorsell

Chalmers, Microtechnology and Nanoscience (MC2), Microwave Electronics

2016 87th ARFTG Microwave Measurement Conference

7501956

Areas of Advance

Information and Communication Technology

Subject Categories

Signal Processing

DOI

10.1109/ARFTG.2016.7501956

ISBN

978-1-5090-1308-1

More information

Created

10/7/2017