Wideband RF characterization setup with high dynamic range low frequency measurement capabilities
Paper i proceeding, 2016

In this paper, a wideband RF characterization setup with low-frequency (LF) measurement capabilities is presented. Simultaneous LF and RF measurements enable studies of trapping phenomena, thermal effects and other LF-related nonlinear distortion in microwave devices using realistic wideband RF stimuli. The setup is capable of measuring up to 4 GHz through the RF path, and from DC to 125 MHz through the LF path. A study is made on how device linearity is affected by the choice of power supply unit (PSU). LF measurements reveal significant differences in baseband termination in the PSUs, consequently affecting the linearity of the measured RF output spectrum.

Radio frequency

Frequency measurement

Voltage measurement

Current measurement

Baseband

Wideband

Författare

Sebastian Gustafsson

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Christian Fager

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Koen Buisman

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Mattias Thorsell

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

2016 87th ARFTG Microwave Measurement Conference

7501956

Styrkeområden

Informations- och kommunikationsteknik

Ämneskategorier

Signalbehandling

DOI

10.1109/ARFTG.2016.7501956

ISBN

978-1-5090-1308-1

Mer information

Skapat

2017-10-07