On the implementation of device processing tolerances in FET Large Signal Models
Paper i proceeding, 2012

Device technology is becoming quite mature and repeatable, but nevertheless, for various reasons, there are statistical variations in device parameters. These process variations will influence the accuracy of the designs and yield in production. The implementation of these variations in Large Signal Models is discussed in the paper.

FET

Statistical Models

Large Signal Models

Författare

Iltcho Angelov

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Mattias Ferndahl

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

Marcus Gavell

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

2012 Workshop on Integrated Nonlinear Microwave and Millimetre-Wave Circuits, INMMIC 2012

6331917

Ämneskategorier

Elektroteknik och elektronik

DOI

10.1109/INMMIC.2012.6331917

ISBN

978-146732949-1

Mer information

Skapat

2017-10-08