Characterization of Interface Defects
Kapitel i bok, 2010

LF noise

Charge pumping

Interface defect

C-V response

Low frequency noise

Författare

P.K. Hurley

Tyndall National Institute at National University of Ireland, Cork

Olof Engström

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

D. Bauza

Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation

G. Ghibaudo

Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation

Nanoscale CMOS (ed. Balestra)

545-573

Ämneskategorier

Elektroteknik och elektronik

DOI

10.1002/9781118621523.ch15

ISBN

9781848211803

Mer information

Skapat

2017-10-07