Characterization of Interface Defects
Kapitel i bok, 2013
Interface defect
Low frequency noise
Charge pumping
LF noise
C-V response
Författare
P.K. Hurley
Tyndall National Institute at National University of Ireland, Cork
Olof Engström
Chalmers, Mikroteknologi och nanovetenskap, Mikrovågselektronik
D. Bauza
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
G. Ghibaudo
Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation
Nanoscale CMOS (ed. Balestra)
545-573
Ämneskategorier
Elektroteknik och elektronik
DOI
10.1002/9781118621523.ch15