Characterization of Interface Defects
Kapitel i bok, 2013

Interface defect

Low frequency noise

Charge pumping

LF noise

C-V response

Författare

P.K. Hurley

Tyndall National Institute at National University of Ireland, Cork

Olof Engström

Chalmers, Mikroteknologi och nanovetenskap (MC2), Mikrovågselektronik

D. Bauza

Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation

G. Ghibaudo

Institut de la Microelectronique, Electromagnetisme et Photonique - Laboratoire d'Hyperfrequences et de Caracterisation

Nanoscale CMOS (ed. Balestra)

545-573

Ämneskategorier

Elektroteknik och elektronik

DOI

10.1002/9781118621523.ch15

Mer information

Senast uppdaterat

2019-11-14