On Skin Effect in On-Chip Interconnects
Paper i proceeding, 2004

We investigate the influence of skin effect on the propagation delays of on-chip interconnects. For long wires, designed in the LC regime, on the top metal layer in a contemporary process, we find that the skin effect causes an extra delay by 10%. The impact of the skin effect on delay is furthermore rapidly increasing with increased interconnect width.

Författare

Daniel Andersson

Chalmers, Institutionen för datorteknik, Integrerade elektroniksystem

Lars Svensson

Chalmers, Institutionen för datorteknik, Integrerade elektroniksystem

Per Larsson-Edefors

Chalmers, Institutionen för datorteknik, Integrerade elektroniksystem

Intl Workshop on Power and Timing Modeling, Optimization and Simulation (PATMOS)

463-470

Ämneskategorier

Data- och informationsvetenskap

DOI

10.1007/978-3-540-30205-6_48