Chemical Vapor Deposition of Vertically Aligned Carbon Nanotube Arrays: Critical Effects of Oxide Buffer Layers
Artikel i vetenskaplig tidskrift, 2019
Vertically aligned carbon nanotubes
Atomic layer deposition
Chemical vapor deposition
Oxide buffer layers
Författare
Haohao Li
Shanghai University
G. Yuan
Shanghai University
B. Shan
Shanghai University
Xiaoxin Zhang
Shanghai University
Hongping Ma
Fudan University
Yingzhong Tian
Shanghai University
Hongliang Lu
Fudan University
Johan Liu
Shanghai University
Chalmers, Mikroteknologi och nanovetenskap, Elektronikmaterial
Nanoscale Research Letters
1931-7573 (ISSN) 1556-276X (eISSN)
Vol. 14 106Ämneskategorier
Oorganisk kemi
Materialkemi
Annan kemiteknik
DOI
10.1186/s11671-019-2938-6