CVD TiAlN coatings with tunable nanolamella architectures

Artikel i vetenskaplig tidskrift, 2021

In this work, Ti1-xAlxN (TiAlN) coatings were synthesized by low pressure chemical vapour deposition (LPCVD), and the influence of a rotational precursor gas supply on the coating microstructure was studied. The microstructure of the TiAlN coatings were characterized using X-ray diffraction (XRD), scanning and transmission electron microscopy (SEM and TEM), and electron backscattered diffraction (EBSD). It is shown that a rotational precursor gas supply induces an oscillatory surface reaction, which causes a nanolamella architecture. When the gas beam directly hits the sample, the local gas flow velocity is high, which increases the deposition rate of Ti and a Ti(Al)N lamella is formed. When the gas beam rotates away, the local gas velocity is low, so the deposition rate of Ti decreases, and an Al(Ti)N lamella is formed. As this is repeated a periodic nanolamella architecture is formed. The nanolamellae grow epitaxially on three {001} facets of the 111 textured grains, which leads to a pyramidal surface morphology. Without gas supply rotation, a high Al content cubic phase was still obtained, but no nanolamella was formed. This indicates that Ti-rich lamellae are not necessary to stabilize an Al-rich cubic TiAlN phase. In addition, spinodal decomposition is not likely to be the driving force behind the nanolamella formation in LPCVD TiAlN, as this would also have happened in the sample without a rotational gas supply. Finally, the nanolamella periodicity is found to be tunable via controlling the rotation speed of the precursor supply relative to the coating growth rate.