Deep-level emissions influenced by O and Zn implantations in ZnO
Artikel i vetenskaplig tidskrift, 2005

A set of bulk ZnO samples implanted with O and Zn at various densities were investigated by photoluminescence. The implantation concentration of O and Zn is varied between 1×1017/cm3 and 5×1019/cm3. The samples were thermally treated in an oxygen gas environment after the implantation. The results clearly show the influence of O and Zn implantations on the deep-level emission. By comparing the photoluminescence spectra for the samples with different implantations, we can conclude that the VZn is responsible to the observed deep-level emission. In addition, a novel transition at the emission energy of 3.08 eV at 77 K appears in the O-implanted sample with 5×1019/cm3 implantation concentration. The novel emission is tentatively identified as O-antisite OZn.

Författare

Qing Xiang Zhao

Göteborgs universitet

Peter Klason

Göteborgs universitet

Magnus Willander

Göteborgs universitet

H. M. Zhong

W. Lu

J. H. Yang

Applied Physics Letters

0003-6951 (ISSN) 1077-3118 (eISSN)

Vol. 87 211912-

Ämneskategorier

Fysik

DOI

10.1063/1.2135880