Direct Photolithographic Patterning of Electrospun Films for Defined Nanofibrillar Microarchitectures
Journal article, 2010

In this letter, a method of generating spatially defined electrospun microarchitectures by direct photolithographic patterning of electrospun Films is described, A photoinitiator, benzoin methyl ether, is incorporated into a solid thermoplastic electrospun polyurethane matrix selectively photo-cross-linked by standard photolithographic methods. Subsequent development in in organic solvent yields spatially defined electrospun microstructures oil a single substrate. Utilizing a multilayer approach, the method allows for the assembly of complex hierarchical electrospun structures on single substrates using methods analogous to the conventional microfabrication of solid-state devices.

membranes

microfabrication

nanoparticles

deposition

fibers

nanofibers

scaffolds

Author

Björn Carlberg

Chalmers, Applied Physics, Electronics Material and Systems Laboratory

Teng Wang

Chalmers, Applied Physics, Electronics Material and Systems Laboratory

Johan Liu

Chalmers, Applied Physics, Electronics Material and Systems Laboratory

Langmuir

07437463 (ISSN) 15205827 (eISSN)

Vol. 26 4 2235-2239

Areas of Advance

Nanoscience and Nanotechnology (2010-2017)

Materials Science

Subject Categories

Physical Chemistry

Physical Sciences

DOI

10.1021/la9045447

More information

Created

10/6/2017