Direct Photolithographic Patterning of Electrospun Films for Defined Nanofibrillar Microarchitectures
Artikel i vetenskaplig tidskrift, 2010

In this letter, a method of generating spatially defined electrospun microarchitectures by direct photolithographic patterning of electrospun Films is described, A photoinitiator, benzoin methyl ether, is incorporated into a solid thermoplastic electrospun polyurethane matrix selectively photo-cross-linked by standard photolithographic methods. Subsequent development in in organic solvent yields spatially defined electrospun microstructures oil a single substrate. Utilizing a multilayer approach, the method allows for the assembly of complex hierarchical electrospun structures on single substrates using methods analogous to the conventional microfabrication of solid-state devices.

membranes

microfabrication

nanoparticles

deposition

fibers

nanofibers

scaffolds

Författare

Björn Carlberg

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Teng Wang

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Johan Liu

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Langmuir

0743-7463 (ISSN) 1520-5827 (eISSN)

Vol. 26 2235-2239

Styrkeområden

Nanovetenskap och nanoteknik

Materialvetenskap

Ämneskategorier

Fysikalisk kemi

Fysik

DOI

10.1021/la9045447