Integrated MEMS-Tunable VCSELs Using a Self-Aligned Reflow Process
Artikel i vetenskaplig tidskrift, 2012

A simple microelectromechanical systems technology for wafer-scale integration of tunable vertical-cavity surface-emitting lasers (VCSELs) is presented. The key element is a self-aligned reflow process to form photoresist droplets, which serve as sacrificial layer and preform for a curved micromirror. Using a 3-D electromagnetic model, the half-symmetric cavity is optimized for singlemode emission. The technology is demonstrated for electrically pumped, short-wavelength (850 nm) tunable VCSELs, but is transferable to other wavelengths and material systems. Fabricated devices with 10 mu m large current aperture are singlemode and tunable over 24 nm. An improved high-speed design with reduced parasitic capacitance enables direct modulation with 3dB-bandwidths up to 6 GHz and data transmission at 5Gbit/s. Small signal analysis shows that the intrinsic parameters (resonance frequency and damping) are wavelength dependent through the differential gain.

Microelectromechanical system

microlens

tunable laser

tunnel-junction

photoresist

mode

vertical-cavity surface-emitting laser

laser

wafer-scale integration

reflow

micromirror

Författare

Benjamin Kögel

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

P. Debernardi

Consiglio Nazionale delle Ricerche

Petter Westbergh

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

Johan Gustavsson

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

Åsa Haglund

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

Erik Haglund

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

Jörgen Bengtsson

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

Anders Larsson

Chalmers, Mikroteknologi och nanovetenskap (MC2), Fotonik

IEEE Journal of Quantum Electronics

0018-9197 (ISSN)

Vol. 48 144-152

Ämneskategorier

Fysik

DOI

10.1109/JQE.2011.2172191