Understanding noninvasive charge transfer doping of graphene: a comparative study
Artikel i vetenskaplig tidskrift, 2018

In this work, we systematically investigate and compare noninvasive doping of chemical vapor deposition graphene with three molecule dopants through spectroscopy and electrical conductivity techniques. Thionyl chloride shows the smallest improvement in conductivity with poor temporal and thermal stability and nitric acid induces the biggest sheet resistance reduction with modified stability. Molybdenum trioxide doping stands out, after thermal annealing, with both causing a significant sheet-resistance reduction and having superior temporal and thermal stability. These properties make it ideal for applications in advanced electronics. Theoretical studies based on the van der Waals density functional method suggest that cluster formation of molybdenum trioxide underpins the significant reduction in sheet resistance, and the stability, that arises after thermal annealing. Our comparative study clarifies charge transfer doping of graphene and brings understanding of the weak-interaction nature of such non-destructive doping of graphene. Our work also shows that we can use weak chemisorption to tailor the electronic properties of graphene, for example, to improve conductivity. This ability open up possibilities for further use of graphene in electronic interconnects, field effect transistors and other systems.

Författare

Ankit Nalin Mehta

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Wei Mu

Shanghai University

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Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Murali Murugesan

SHT Smart High-Tech

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Yang Jiao

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Yifeng Fu

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Per Hyldgaard

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Johan Liu

Shanghai University

Chalmers, Mikroteknologi och nanovetenskap (MC2), Elektronikmaterial och system

Journal of Materials Science: Materials in Electronics

0957-4522 (ISSN) 1573-482X (eISSN)

Vol. 29 5239-5252

Ämneskategorier

Oorganisk kemi

Materialkemi

Den kondenserade materiens fysik

DOI

10.1007/s10854-017-8443-8