Ultrathin 3R-MoS2 metasurfaces with atomically precise edges for efficient nonlinear nanophotonics
Artikel i vetenskaplig tidskrift, 2025
Dielectric metasurfaces that combine high-index materials with optical nonlinearities are recognized for their potential in quantum and classical nanophotonic applications. However, the fabrication of high-quality metasurfaces poses material-dependent challenges, as their designs are often susceptible to disorder, defects, and scattering losses, mostly occurring at the edges of nanostructured features. Additionally, the choice of the material platforms featuring second-order optical nonlinearities χ(2), is limited to broken-inversion symmetry crystals such as GaAs, GaP, LiNbO3, and various bulk van der Waals materials. Here, we use a combination of top-down lithography and anisotropic wet etching of a specially stacked van der Waals crystal – 3R-MoS2, which exhibits both a high refractive index and exceptional χ(2) nonlinearity, to produce ultrathin (~20–25 nm) metasurfaces with atomically sharp edges, where the etching breaks the in-plane symmetry of the meta-atoms. The broken symmetry manifests as a quasi-boundstate-in-the-continuum, enabling the enhancement of second-harmonic generation of three orders of magnitude at specific wavelengths.
Författare
Georgii Zograf
Chalmers, Fysik, Nano- och biofysik
Betül Kücüköz
Chalmers, Fysik, Nano- och biofysik
Aleksandr Poliakov
Chalmers, Fysik, Nano- och biofysik
Andrew Yankovich
Chalmers, Fysik, Nano- och biofysik
Alok Ranjan
Chalmers, Fysik, Nano- och biofysik
Maria Bancerek
Uniwersytet Warszawski
Abhay V. Agrawal
Chalmers, Fysik, Nano- och biofysik
Eva Olsson
Chalmers, Fysik, Nano- och biofysik
Witlef Wieczorek
Chalmers, Mikroteknologi och nanovetenskap, Kvantteknologi
Tomasz Antosiewicz
Uniwersytet Warszawski
Chalmers, Fysik, Bionanofotonik
Timur Shegai
Chalmers, Fysik, Nano- och biofysik
Communications Physics
23993650 (eISSN)
Vol. 8 1 271Avstämbara optiska resonatorer och metamaterial genom Casimir självmontering
Vetenskapsrådet (VR) (2022-03347), 2023-01-01 -- 2026-12-31.
2D material-baserad teknologi för industriella applikationer (2D-TECH)
GKN Aerospace (2D-tech), 2021-01-01 -- 2024-12-31.
VINNOVA (2019-00068), 2020-05-01 -- 2024-12-31.
VINNOVA (2024-03852), 2023-11-01 -- 2029-12-31.
Plasmon-exciton coupling at the attosecond-subnanometer scale: Tailoring strong light-matter interactions at room temperature
Knut och Alice Wallenbergs Stiftelse (2019.0140), 2020-07-01 -- 2025-06-30.
Ämneskategorier (SSIF 2025)
Atom- och molekylfysik och optik
Den kondenserade materiens fysik
Annan fysik
Infrastruktur
Chalmers materialanalyslaboratorium
Myfab (inkl. Nanotekniklaboratoriet)
DOI
10.1038/s42005-025-02194-y