Eunjung Cha

Doctoral Student at Chalmers, Microtechnology and Nanoscience (MC2), Terahertz and Millimetre Wave Laboratory

Eunjung is a Ph.D. student at the Terahertz and Millimeter Wave Laboratory (TML) since August 2015. She focuses her research on ultra low-noise cryogenic InP HEMT. The aim is to develop the low-noise, stable, and low-power InP HEMT at cryogenic operation. Eunjung’s main task is to investigate various HEMT heterostructures (i.e. barrier and channel thickness and composition) and transistor layout, as well as optimize the fabrication process (i.e. ohmic and the gate contact, and recess technology), which can help to improve the noise performance of cryogenic low noise amplifiers from sub-GHz to hundreds of GHz with very low power dissipation. She received a Master's degree in Physics at Lund University in 2014.

Source: chalmers.se

Showing 7 publications

2018

0.3-14 and 16-28 GHz Wide-Bandwidth Cryogenic MMIC Low-Noise Amplifiers

Eunjung Cha, Niklas Wadefalk, Per Ake Nilsson et al
IEEE Transactions on Microwave Theory and Techniques. Vol. 66 (11), p. 4860-4869
Journal article
2017

Two-Finger InP HEMT Design for Stable Cryogenic Operation of Ultra-Low-Noise Ka- and Q-Band LNAs

Eunjung Cha, Giuseppe Moschetti, Niklas Wadefalk et al
IEEE Transactions on Microwave Theory and Techniques. Vol. 65 (12), p. 5171-5180
Journal article
2017

Two-finger InP HEMT design for stable cryogenic operation of ultra-low-noise Ka-band LNAs

Eunjung Cha, Giuseppe Moschetti, Niklas Wadefalk et al
IEEE MTT-S International Microwave Symposium Digest, p. 168-171
Paper in proceedings
2017

Cryogenic LNAs for SKA band 2 to 5

Joel Schleeh, Giuseppe Moschetti, Niklas Wadefalk et al
IEEE MTT-S International Microwave Symposium Digest, p. 164-167
Paper in proceedings
2017

Cryogenic W-band LNA for ALMA band 2+3 with average noise temperature of 24 K

Yulung Tang, Niklas Wadefalk, J. Kooi et al
IEEE MTT-S International Microwave Symposium Digest, p. 176-179
Paper in proceedings
2016

Cryogenic low-noise InP HEMTs: A source-drain distance study

Eunjung Cha, Arsalan Pourkabirian, Joel Schleeh et al
2016 Compound Semiconductor Week, CSW 2016, p. Article number 7528576-
Paper in proceedings

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