Direct Chemical Vapor Deposition of Large-Area Carbon Thin Films on Gallium Nitride for Transparent Electrodes: A First Attempt
Journal article, 2012

Direct formation of large-area carbon thin films on gallium nitride by chemical vapor deposition without metallic catalysts is demonstrated. A high flow of ammonia is used to stabilize the surface of the GaN (0001)/sapphire substrate during the deposition at 950 degrees C. Various characterization methods verify that the synthesized thin films are largely sp(2) bonded, macroscopically uniform, and electrically conducting. The carbon thin films possess optical transparencies comparable to that of exfoliated graphene. This paper offers a viable route toward the use of carbon-based materials for future transparent electrodes in III-nitride optoelectronics, such as GaN-based light emitting diodes and laser diodes.

GaN

III-V semiconductors

ammonia

graphene

Chemical vapor deposition

chemical vapour deposition

transparent electrodes

Author

Jie Sun

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

M. T. Cole

University of Cambridge

S. Awais Ahmad

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Olof Bäcke

Chalmers, Applied Physics, Eva Olsson Group

Tommy Ive

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Markus Löffler

Chalmers, Applied Physics, Eva Olsson Group

Chalmers, Applied Physics, Microscopy and Microanalysis

Niclas Lindvall

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Eva Olsson

Chalmers, Applied Physics, Eva Olsson Group

K. B. K. Teo

AIXTRON Nanoinstruments Ltd.

Johan Liu

Chalmers, Applied Physics, Electronics Material and Systems Laboratory

Anders Larsson

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

Avgust Yurgens

Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics

Åsa Haglund

Chalmers, Microtechnology and Nanoscience (MC2), Photonics

IEEE Transactions on Semiconductor Manufacturing

0894-6507 (ISSN)

Vol. 25 3 494-501

Areas of Advance

Nanoscience and Nanotechnology

Infrastructure

Nanofabrication Laboratory

Subject Categories

Other Electrical Engineering, Electronic Engineering, Information Engineering

DOI

10.1109/tsm.2012.2198676

More information

Latest update

5/2/2018 7