Direct Chemical Vapor Deposition of Large-Area Carbon Thin Films on Gallium Nitride for Transparent Electrodes: A First Attempt
Journal article, 2012
Direct formation of large-area carbon thin films on gallium nitride by chemical vapor deposition without metallic catalysts is demonstrated. A high flow of ammonia is used to stabilize the surface of the GaN (0001)/sapphire substrate during the deposition at 950 degrees C. Various characterization methods verify that the synthesized thin films are largely sp(2) bonded, macroscopically uniform, and electrically conducting. The carbon thin films possess optical transparencies comparable to that of exfoliated graphene. This paper offers a viable route toward the use of carbon-based materials for future transparent electrodes in III-nitride optoelectronics, such as GaN-based light emitting diodes and laser diodes.
chemical vapour deposition
ammonia
transparent electrodes
III-V semiconductors
Chemical vapor deposition
GaN
graphene
Author
Jie Sun
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
M. T. Cole
University of Cambridge
S. Awais Ahmad
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
Olof Bäcke
Chalmers, Applied Physics, Eva Olsson Group
Tommy Ive
Chalmers, Microtechnology and Nanoscience (MC2), Photonics
Markus Löffler
Chalmers, Applied Physics, Eva Olsson Group
Chalmers, Applied Physics, Microscopy and Microanalysis
Niclas Lindvall
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
Eva Olsson
Chalmers, Applied Physics, Eva Olsson Group
K. B. K. Teo
Aixtron
Johan Liu
Chalmers, Applied Physics, Electronics Material and Systems Laboratory
Anders Larsson
Chalmers, Microtechnology and Nanoscience (MC2), Photonics
Avgust Yurgens
Chalmers, Microtechnology and Nanoscience (MC2), Quantum Device Physics
Åsa Haglund
Chalmers, Microtechnology and Nanoscience (MC2), Photonics
IEEE Transactions on Semiconductor Manufacturing
0894-6507 (ISSN)
Vol. 25 3 494-501Areas of Advance
Nanoscience and Nanotechnology (SO 2010-2017, EI 2018-)
Infrastructure
Nanofabrication Laboratory
Subject Categories
Other Electrical Engineering, Electronic Engineering, Information Engineering
DOI
10.1109/tsm.2012.2198676